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A new fabrication process for Ni-Ti shape memory thin films
T. Lehnert
, S. Tixier
,
P. Böni
, R. Gotthardt
EPFL
Paul Scherrer Institute
Research output
:
Contribution to journal
›
Article
›
peer-review
66
Scopus citations
Overview
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Keyphrases
Fabrication Methods
100%
Shape Memory
100%
NiTi
100%
Ti Layer
66%
Differential Scanning Calorimetry
33%
X Ray Diffraction
33%
Recrystallization
33%
Heat Treatment
33%
Thickness Ratio
33%
Microstructure
33%
Interdiffusion
33%
Annealing Process
33%
Shape Memory Effect
33%
Transmission Electron Microscopy
33%
Annealed Films
33%
DC Magnetron Sputtering
33%
Ni Layer
33%
Single-layer Thickness
33%
Ti Thin Film
33%
Pure Ti
33%
Martensitic Phase
33%
Transformation Behavior
33%
NiTi Intermetallic Compound
33%
Austenite Phase
33%
Homogeneous Deposition
33%
R-phase
33%
Martensitic Transformation
33%
Pure Ni
33%
Transformation Temperature
33%
Calorimetry Measurement
33%
Engineering
Thin Films
100%
Magnetron
50%
Fabrication Method
50%
Layer Thickness
50%
Heat Treatment
50%
Memory Effect
50%
Austenite Phase
50%
Thickness Ratio
50%
Interdiffusion
50%
Intermetallics
50%
X Ray Diffraction
50%
Material Science
Film
100%
Shape Memory
100%
Thin Films
100%
Heat Treatment
25%
X-Ray Diffraction
25%
Differential Scanning Calorimetry
25%
Shape Memory Effect
25%
Transmission Electron Microscopy
25%
Austenite
25%
Intermetallics
25%