A compact model for NBTI degradation and recovery under use-profile variations and its application to aging analysis of digital integrated circuits

Veit B. Kleeberger, Martin Barke, Christoph Werner, Doris Schmitt-Landsiedel, Ulf Schlichtmann

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

We present an aging analysis which considers variations in chip environment and workload as they are caused by dynamic voltage or frequency scaling, power-down modes, etc. Therefore, we developed a model for NBTI degradation and recovery based on trapping/detrapping. Our model accurately describes the relaxation during detrapping, the quasi-permanent degradation and shows good agreement with measurements from a 65 nm technology. The aging analysis utilizes this model to consider variations in environment and workload. Results show that our analysis can be used for system-level design decisions and reduces substantially estimated degradation.

Original languageEnglish
Pages (from-to)1083-1089
Number of pages7
JournalMicroelectronics Reliability
Volume54
Issue number6-7
DOIs
StatePublished - 2014

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