Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

M. V.F. Schlupp, M. Prestat, J. Martynczuk, J. L.M. Rupp, A. Bieberle-Hütter, L. J. Gauckler

Publikation: Beitrag in FachzeitschriftArtikelBegutachtung

33 Zitate (Scopus)

Abstract

Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from β-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 °C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising.

OriginalspracheEnglisch
Seiten (von - bis)47-55
Seitenumfang9
FachzeitschriftJournal of Power Sources
Jahrgang202
DOIs
PublikationsstatusVeröffentlicht - 15 März 2012
Extern publiziertJa

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