Surface analysis and bioreactions of F and Si containing a-C:H

R. Hauert; U. Müller; G. Francz; F. Birchler; A. Schroeder; J. Mayer; E. Wintermantel

doi:10.1016/S0040-6090(97)00422-7

Surface analysis and bioreactions of F and Si containing a-C:H

R. Hauert, U. Müller, G. Francz, F. Birchler, A. Schroeder, J. Mayer, E. Wintermantel

Publikation: Beitrag in Fachzeitschrift › Artikel › Begutachtung

49 Zitate (Scopus)

Abstract

Amorphous hydrogenated carbon films containing different amounts of fluorine and silicon have been deposited by plasma activated chemical vapor deposition in a stainless steel high vacuum system, using different mixtures of acetylene and either trifluoromethane or tetramethylsilane. Film composition and the different chemical states present have been characterized by X-ray photoelectron spectroscopy. Cell culture tests with fibroblasts revealed a good surface biocompatibility by means of morphological behavior, but no dependence on the Si or F content in the a-C:H films could be seen. All cells showed good spreading on the surface. Within 2 days confluent cell layers were observed.

Originalsprache	Englisch
Seiten (von - bis)	191-194
Seitenumfang	4
Fachzeitschrift	Thin Solid Films
Jahrgang	308-309
Ausgabenummer	1-4
DOIs	https://doi.org/10.1016/S0040-6090(97)00422-7
Publikationsstatus	Veröffentlicht - 31 Okt. 1997
Extern publiziert	Ja

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10.1016/S0040-6090(97)00422-7

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abstract = "Amorphous hydrogenated carbon films containing different amounts of fluorine and silicon have been deposited by plasma activated chemical vapor deposition in a stainless steel high vacuum system, using different mixtures of acetylene and either trifluoromethane or tetramethylsilane. Film composition and the different chemical states present have been characterized by X-ray photoelectron spectroscopy. Cell culture tests with fibroblasts revealed a good surface biocompatibility by means of morphological behavior, but no dependence on the Si or F content in the a-C:H films could be seen. All cells showed good spreading on the surface. Within 2 days confluent cell layers were observed.",

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doi = "10.1016/S0040-6090(97)00422-7",

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AU - Hauert, R.

AU - Müller, U.

AU - Francz, G.

AU - Birchler, F.

AU - Schroeder, A.

AU - Mayer, J.

AU - Wintermantel, E.

PY - 1997/10/31

Y1 - 1997/10/31

N2 - Amorphous hydrogenated carbon films containing different amounts of fluorine and silicon have been deposited by plasma activated chemical vapor deposition in a stainless steel high vacuum system, using different mixtures of acetylene and either trifluoromethane or tetramethylsilane. Film composition and the different chemical states present have been characterized by X-ray photoelectron spectroscopy. Cell culture tests with fibroblasts revealed a good surface biocompatibility by means of morphological behavior, but no dependence on the Si or F content in the a-C:H films could be seen. All cells showed good spreading on the surface. Within 2 days confluent cell layers were observed.

AB - Amorphous hydrogenated carbon films containing different amounts of fluorine and silicon have been deposited by plasma activated chemical vapor deposition in a stainless steel high vacuum system, using different mixtures of acetylene and either trifluoromethane or tetramethylsilane. Film composition and the different chemical states present have been characterized by X-ray photoelectron spectroscopy. Cell culture tests with fibroblasts revealed a good surface biocompatibility by means of morphological behavior, but no dependence on the Si or F content in the a-C:H films could be seen. All cells showed good spreading on the surface. Within 2 days confluent cell layers were observed.

KW - Amorphous carbon

KW - Bioreaction

KW - Si-a-C:H

KW - XPS

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Surface analysis and bioreactions of F and Si containing a-C:H

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