Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium

C. Hertl, L. Koll, T. Schmitz, E. Werner, U. Gbureck

Publikation: Beitrag in FachzeitschriftArtikelBegutachtung

21 Zitate (Scopus)

Abstract

Titanium substrates were coated with tantalum layers of 5 μm thickness using physical vapour deposition (PVD). The tantalum layers showed a (110)-preferred orientation. The coated samples were hardened by oxygen diffusion. Using X-ray diffraction the crystallographic structure of the tantalum coatings was characterised, comparing untreated and diffusion hardened specimen conditions. Oxygen depth profiles were determined by glow discharge spectrometry. The hardening effect of the heat treatment was examined by Vickers microhardness testing. The increase of surface hardness caused by oxygen diffusion was at least 50%.

OriginalspracheEnglisch
Seiten (von - bis)28-35
Seitenumfang8
FachzeitschriftMaterials Science and Engineering C
Jahrgang41
DOIs
PublikationsstatusVeröffentlicht - 1 Aug. 2014

Fingerprint

Untersuchen Sie die Forschungsthemen von „Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium“. Zusammen bilden sie einen einzigartigen Fingerprint.

Dieses zitieren