Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Hyeon Ho Jeong; Andrew G. Mark; Tung Chun Lee; Kwanghyo Son; Wenwen Chen; Mariana Alarcón-Correa; Insook Kim; Gisela Schütz; Peer Fischer

doi:10.1002/advs.201500016

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Hyeon Ho Jeong
, Andrew G. Mark
, Tung Chun Lee
, Kwanghyo Son
, Wenwen Chen
, Mariana Alarcón-Correa
, Insook Kim
, Gisela Schütz
, Peer Fischer

Max Planck Institute for Intelligent Systems
University College London
Heidelberg University
Universität Stuttgart

Publikation: Beitrag in Fachzeitschrift › Artikel › Begutachtung

17 Zitate (Scopus)

Originalsprache	Englisch
Aufsatznummer	1500016
Fachzeitschrift	Advanced Science
Jahrgang	2
Ausgabenummer	7
DOIs	https://doi.org/10.1002/advs.201500016
Publikationsstatus	Veröffentlicht - Juli 2015
Extern publiziert	Ja

Zugriff auf Dokument

10.1002/advs.201500016

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Verknüpfung zur Publikation in Scopus

Dieses zitieren

@article{3a63263031834e4b9bb0314249602799,

title = "Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications",

keywords = "block copolymer micelle nanolithography, glancing angle deposition, nanoimprint lithography, nanoparticle lithography, shadow growth physical vapor deposition",

author = "Jeong, \{Hyeon Ho\} and Mark, \{Andrew G.\} and Lee, \{Tung Chun\} and Kwanghyo Son and Wenwen Chen and Mariana Alarc{\'o}n-Correa and Insook Kim and Gisela Sch{\"u}tz and Peer Fischer",

year = "2015",

month = jul,

doi = "10.1002/advs.201500016",

language = "English",

volume = "2",

journal = "Advanced Science",

issn = "2198-3844",

publisher = "John Wiley and Sons Inc.",

number = "7",

}

TY - JOUR

T1 - Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

AU - Jeong, Hyeon Ho

AU - Mark, Andrew G.

AU - Lee, Tung Chun

AU - Son, Kwanghyo

AU - Chen, Wenwen

AU - Alarcón-Correa, Mariana

AU - Kim, Insook

AU - Schütz, Gisela

AU - Fischer, Peer

PY - 2015/7

Y1 - 2015/7

KW - block copolymer micelle nanolithography

KW - glancing angle deposition

KW - nanoimprint lithography

KW - nanoparticle lithography

KW - shadow growth physical vapor deposition

UR - https://www.scopus.com/pages/publications/84990205696

U2 - 10.1002/advs.201500016

DO - 10.1002/advs.201500016

M3 - Article

AN - SCOPUS:84990205696

SN - 2198-3844

VL - 2

JO - Advanced Science

JF - Advanced Science

IS - 7

M1 - 1500016

ER -