Abstract
Zn(O,S) buffer layer electronic configuration is determined by its composition and thickness, tunable through atomic layer deposition. The Zn K and L-edges in the X-ray absorption near edge structure verify ionicity and covalency changes with S content. A high intensity shoulder in the Zn K-edge indicates strong Zn 4s hybridized states and a preferred c-axis orientation. 2-3 nm thick films with low S content show a subdued shoulder showing less contribution from Zn 4s hybridization. A lower energy shift with film thickness suggests a decreasing bandgap. Further, ZnSO4 forms at substrate interfaces, which may be detrimental for device performance.
Originalsprache | Englisch |
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Seiten (von - bis) | 39105-39109 |
Seitenumfang | 5 |
Fachzeitschrift | ACS Applied Materials and Interfaces |
Jahrgang | 9 |
Ausgabenummer | 45 |
DOIs | |
Publikationsstatus | Veröffentlicht - 15 Nov. 2017 |
Extern publiziert | Ja |