PHOTOELECTROCHEMISTRY OF PASSIVE FILMS ON TITANIUM AND HAFNIUM ELECTRODES MODIFIED BY ION IMPLANTATION.

Ulrich Stimming; B. Danzfuss; J. W. Schultze

PHOTOELECTROCHEMISTRY OF PASSIVE FILMS ON TITANIUM AND HAFNIUM ELECTRODES MODIFIED BY ION IMPLANTATION.

Ulrich Stimming, B. Danzfuss, J. W. Schultze

Columbia University

Publikation: Beitrag in Fachzeitschrift › Konferenzartikel › Begutachtung

Abstract

Ion implantation is a promising technique for surface modification, with the purpose of semi-conductor doping, electrocatalysis, improvement of corrosion resistance and change of crystallinity. In corrosion research most implantation experiments are carried out with bare metals. Here, the influence of doping a preexisting passive film on the electrochemical behavior was studied.

Originalsprache	Englisch
Seiten (von - bis)	39-40
Seitenumfang	2
Fachzeitschrift	Electrochemical Society Extended Abstracts
Jahrgang	85-1
Publikationsstatus	Veröffentlicht - 1985
Extern publiziert	Ja

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title = "PHOTOELECTROCHEMISTRY OF PASSIVE FILMS ON TITANIUM AND HAFNIUM ELECTRODES MODIFIED BY ION IMPLANTATION.",

abstract = "Ion implantation is a promising technique for surface modification, with the purpose of semi-conductor doping, electrocatalysis, improvement of corrosion resistance and change of crystallinity. In corrosion research most implantation experiments are carried out with bare metals. Here, the influence of doping a preexisting passive film on the electrochemical behavior was studied.",

author = "Ulrich Stimming and B. Danzfuss and Schultze, {J. W.}",

year = "1985",

language = "English",

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AU - Stimming, Ulrich

AU - Danzfuss, B.

AU - Schultze, J. W.

PY - 1985

Y1 - 1985

N2 - Ion implantation is a promising technique for surface modification, with the purpose of semi-conductor doping, electrocatalysis, improvement of corrosion resistance and change of crystallinity. In corrosion research most implantation experiments are carried out with bare metals. Here, the influence of doping a preexisting passive film on the electrochemical behavior was studied.

AB - Ion implantation is a promising technique for surface modification, with the purpose of semi-conductor doping, electrocatalysis, improvement of corrosion resistance and change of crystallinity. In corrosion research most implantation experiments are carried out with bare metals. Here, the influence of doping a preexisting passive film on the electrochemical behavior was studied.

UR - http://www.scopus.com/inward/record.url?scp=0021787188&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0021787188

SN - 0160-4619

VL - 85-1

SP - 39

EP - 40

JO - Electrochemical Society Extended Abstracts

JF - Electrochemical Society Extended Abstracts

ER -

PHOTOELECTROCHEMISTRY OF PASSIVE FILMS ON TITANIUM AND HAFNIUM ELECTRODES MODIFIED BY ION IMPLANTATION.

Abstract

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