Abstract
In this work we present a model which is able to describe the initial injection of charge caused by the loss of kinetic energy of a single ion penetrating a semiconductor power device. Two-dimensional simulations of a reverse biased power diode yield the temporal and spatial evolutions of the electric field as well as the carrier densities in the interior of the device initiated by the ion-induced charge plasma. For sufficiently high biases strong charge multiplication suddenly sets on which conforms to recent experimental findings.
| Originalsprache | Englisch |
|---|---|
| Seiten | 223-226 |
| Seitenumfang | 4 |
| Publikationsstatus | Veröffentlicht - 2001 |
| Veranstaltung | 13th International Symposium on Power Semiconductor Devices and ICs (ISPSD'01) - Osaka, Japan Dauer: 4 Juni 2001 → 7 Juni 2001 |
Konferenz
| Konferenz | 13th International Symposium on Power Semiconductor Devices and ICs (ISPSD'01) |
|---|---|
| Land/Gebiet | Japan |
| Ort | Osaka |
| Zeitraum | 4/06/01 → 7/06/01 |
UN SDGs
Dieser Output leistet einen Beitrag zu folgendem(n) Ziel(en) für nachhaltige Entwicklung
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SDG 7 – Erschwingliche und saubere Energie
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