Microscopic identification of the origin of generation-recombination noise in hydrogenated amorphous silicon with noise-detected magnetic resonance

S. T.B. Goennenwein, M. W. Bayerl, M. S. Brandt, M. Stutzmann

Publikation: Beitrag in FachzeitschriftArtikelBegutachtung

12 Zitate (Scopus)

Abstract

Spin-dependent changes in the noise power of undoped amorphous hydrogenated silicon (a-Si:H) are observed under electron spin resonance conditions. The noise-detected magnetic resonance (NDMR) signal has the g value of holes in the valence band tail of a-Si:H. Both the sign of the NDMR signal and the frequency dependence of its intensity can be quantitatively accounted for by a resonant reduction of the generation-recombination noise time constant τ. This identifies hopping in the valence-band tail as the dominant spin-dependent step governing noise in this material.

OriginalspracheEnglisch
Seiten (von - bis)5188-5191
Seitenumfang4
FachzeitschriftPhysical Review Letters
Jahrgang84
Ausgabenummer22
DOIs
PublikationsstatusVeröffentlicht - 2000

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