Measurement and Analysis of Dynamic Impedance Spectra Acquired During the Oscillatory Electrodissolution of p-Type Silicon in Fluoride-Containing Electrolytes

Using dynamic multifrequency analysis (DMFA), we investigated the oscillatory reaction dynamics that govern the anodic electrodissolution of p-type silicon in fluoride-containing electrolytes, in which the anodization of silicon is followed by the chemical etching of the oxide layer. By applying a constant voltage to the silicon electrode, stable oscillations are found in the presence of an external resistance. The dynamic impedance spectra acquired through DMFA were fitted to a suitable electrical equivalent circuit. In doing so, it was possible to investigate the temporal evolution of the kinetic parameters throughout the formation and dissolution of the silicon oxide.