Abstract
Masking patterns of steady state test-tones, masked by subcritical as well as critical bandmaskers at 8. 5 kHz of equal intensity are determined. Two SPL's of the masker are considered, viz. 80 dB and 60 dB. The pattern of the subcritical band masker showed up to be inferior to the pattern of the critical band masker. A pure-tone masker and an extremely narrow noise masker ( less than equivalent to 1/18 critical band wide) give rise to almost the same masking pattern. Subcritical bandmaskers exhibit steeper slopes of the masking pattern than the critical band-masker.
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 167-171 |
| Seitenumfang | 5 |
| Fachzeitschrift | Acustica |
| Jahrgang | 34 |
| Ausgabenummer | 3 |
| Publikationsstatus | Veröffentlicht - 1976 |