Abstract
A study was performed on hydrosilylation of crystalline silicon (111) and hydrogenated amorphous silicon surfaces. The x-ray photoelectron spectroscopy was used to analyze the resulting chemical surface structure. It was shown that the results demonstrated successful hydrosilylation on both substrate materials.
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 2289-2294 |
Seitenumfang | 6 |
Fachzeitschrift | Journal of Applied Physics |
Jahrgang | 94 |
Ausgabenummer | 4 |
DOIs | |
Publikationsstatus | Veröffentlicht - 15 Aug. 2003 |