TY - GEN
T1 - High-yield metal transfer printing on alkyl bis-phosphonate monolayers
AU - Pathak, Anshuma
AU - Bora, Achyut
AU - Tornow, Marc
AU - Haeberle, Tobias
AU - Lugli, Paolo
AU - Schwartz, Jeffrey
N1 - Publisher Copyright:
© 2015 IEEE.
PY - 2015
Y1 - 2015
N2 - The successful transfer printing of thin metal films onto monolayers of aliphatic bisphosphonic acids (bisPAs) is reported. These monolayers were prepared from solution on plasma-grown aluminum oxide, and were compared with analogous monolayers of alkyl monophosphonic acids (monoPAs) for transfer printing efficacy. Water contact angle and AFM measurements indicated uniform films formed from both classes of phosphonic acids. Evaporated Au/Ti films were prepared using patterned polymeric stamps, and were transfer printed onto the various phosphonate monolayers; this process resulted in close to 100% yield for bisPA monolayers, but only poor results were measured for the monoPAs. We attribute efficient printing onto bisPA monolayers to the formation of strong chemical bonds between distal phosphonic acid groups and the stamp-adhered metal film via its native Ti-oxide termination.
AB - The successful transfer printing of thin metal films onto monolayers of aliphatic bisphosphonic acids (bisPAs) is reported. These monolayers were prepared from solution on plasma-grown aluminum oxide, and were compared with analogous monolayers of alkyl monophosphonic acids (monoPAs) for transfer printing efficacy. Water contact angle and AFM measurements indicated uniform films formed from both classes of phosphonic acids. Evaporated Au/Ti films were prepared using patterned polymeric stamps, and were transfer printed onto the various phosphonate monolayers; this process resulted in close to 100% yield for bisPA monolayers, but only poor results were measured for the monoPAs. We attribute efficient printing onto bisPA monolayers to the formation of strong chemical bonds between distal phosphonic acid groups and the stamp-adhered metal film via its native Ti-oxide termination.
KW - Alkyl bisphosphonic acid
KW - Polymeric stamp
KW - Self-assembled monolayer
KW - Top metal contact
KW - Transfer printing
UR - http://www.scopus.com/inward/record.url?scp=84990876499&partnerID=8YFLogxK
U2 - 10.1109/NANO.2015.7485973
DO - 10.1109/NANO.2015.7485973
M3 - Conference contribution
AN - SCOPUS:84990876499
T3 - IEEE-NANO 2015 - 15th International Conference on Nanotechnology
SP - 1559
EP - 1563
BT - IEEE-NANO 2015 - 15th International Conference on Nanotechnology
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 15th IEEE International Conference on Nanotechnology, IEEE-NANO 2015
Y2 - 27 July 2015 through 30 July 2015
ER -