@inproceedings{c8e3df3238e14c07a3a1a93242bb46a5,
title = "High spatial resolution STXM at 6.2 keV photon energy",
abstract = "We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.",
keywords = "Atomic layer deposition, Electron-beam lithography, X-ray diffractive optics, X-ray microscopy",
author = "Joan Vila-Comamala and Martin Dierolf and Kewish, {Cameron M.} and Pierre Thibault and Tero Pilvi and Elina F{\"a}rm and Vitaliy Guzenko and Sergey Gorelick and Andreas Menzel and Oliver Bunk and Mikko Ritala and Franz Pfeiffer and Christian David",
year = "2010",
doi = "10.1063/1.3399261",
language = "English",
isbn = "9780735407640",
series = "AIP Conference Proceedings",
pages = "80--84",
booktitle = "X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20",
note = "20th International Congress on X-ray Optics and Microanalysis, ICXOM20 ; Conference date: 15-09-2009 Through 18-09-2009",
}