Abstract
Clock skews are determined by measuring device and metal line parameters as a function of position over chip and wafer. Experimental results are separated into a basic random fluctuation part and processing related contributions on chip and wafer level. Different clock tree circuits are simulated based on the measured data, and characterized with the delay, power consumption, layout area and temperature as parameters. Simulations yield a worst case skew of 42ps for a 0.25μm process and a metal3 H-clock tree.
| Originalsprache | Englisch |
|---|---|
| Seiten | 7-9 |
| Seitenumfang | 3 |
| Publikationsstatus | Veröffentlicht - 1999 |
| Extern publiziert | Ja |
| Veranstaltung | Proceedings of the 1999 4th International Workshop on Statistical Metrology (1999 IWSM) - Kyoto, Jpn Dauer: 12 Juni 1999 → 12 Juni 1999 |
Konferenz
| Konferenz | Proceedings of the 1999 4th International Workshop on Statistical Metrology (1999 IWSM) |
|---|---|
| Ort | Kyoto, Jpn |
| Zeitraum | 12/06/99 → 12/06/99 |
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